Power, performance, and area evaluation across 180nm-28nm technology nodes based on benchmark circuits
Author:
Affiliation:
1. Institute of Microelectronics of the Chinese Academy of Sciences
2. University of Chinese Academy of sciences
3. State Key Lab of Fabrication Technologies for Integrated Circuits
Publisher
Institute of Electronics, Information and Communications Engineers (IEICE)
Link
https://www.jstage.jst.go.jp/article/elex/21/9/21_21.20240194/_pdf
Reference33 articles.
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3. [3] R. Chau, et al.: “Benchmarking nanotechnology for high-performance and low-power logic transistor applications,” IEEE Trans Nanotechnol. 4 (2005) 153 (DOI: 10.1109/TNANO.2004.842073).
4. [4] X. Jiang, et al.: “New assessment methodology based on energy-delay-yield cooptimization for nanoscale CMOS technology,” IEEE Trans. Electron Devices 62 (2015) 1746 (DOI: 10.1109/TED.2015.2396575).
5. [5] M. Badaroglu and J. Xu: “Interconnect-aware device targeting from PPA perspective,” IEEE/ACM International Conference on Computer-Aided Design (ICCAD) (2016) 1 (DOI: 10.1145/2966986.2980068).
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