Boron-doped amorphous carbon film grown by bias assisted pyrolysis chemical vapor deposition
Author:
Affiliation:
1. Facuty of Electrical Engineering, UiTM Sarawak Kampus Kota Samarahan Jalan Meranek
2. NANO-ElecTronic Centre, Faculty of Electrical Engineering, Universiti Teknologi MARA
3. NANO-SciTech Centre, Institute of Science, Universiti Teknologi MARA
Publisher
Institute of Electronics, Information and Communications Engineers (IEICE)
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
https://www.jstage.jst.go.jp/article/elex/12/3/12_11.20140937/_pdf
Reference18 articles.
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