Modeling of liquid tin target deformation by laser pulse
Author:
Affiliation:
1. Keldysh Institute of Applied Mathematics
Publisher
Keldysh Institute of Applied Mathematics
Subject
General Medicine
Reference24 articles.
1. Bakshi V. EUV Sources for Lithography / ed. Bakshi V. 1000 20th Street, Bellingham, WA 98227-0010 USA: SPIE, 2006.
2. Banine V.Y., Koshelev K.N., Swinkels G.H.P.M. Physical processes in EUV sources for microlithography // J. Phys. D. Appl. Phys. 2011. Vol. 44, № 25. P. 253001.
3. Koshelev K.N. et al. RZLINE code modeling of distributed tin targets for laser-produced plasma sources of extreme ultraviolet radiation // J. Micro/Nanolithography, MEMS, MOEMS. 2012. Vol. 11, № 2. P. 021112–1.
4. Brandt D.C. et al. LPP EUV source readiness for NXE 3300B // Proc. SPIE / ed. Wood O.R., Panning E.M. 2014. Vol. 9048. P. 90480C.
5. Murakami M. et al. Conversion efficiency of extreme ultraviolet radiation in laser-produced plasmas // Phys. Plasmas. 2006. Vol. 13, № 3. P. 33107.
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1. On experimental and numerical study of the dynamics of a liquid metal jet hit by a laser pulse;Experiments in Fluids;2020-04-22
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