SILICON-CONTAINING OLIGOMERIC AZOINITIATORS IN THE SYNTHESIS OF BLOCK COPOLYMERS

Author:

Busko N.A.ORCID, ,Grishchenko V.K.ORCID,Barantsova A.V.ORCID,Gudzenko N.V.ORCID,Kochetova Ya.V.ORCID,Ostapyk S.N.ORCID, , , , ,

Abstract

The aim of the work was to develop methods for the synthesis and study of the properties of silicon-containing oligomeric azo- and polyazoinitiators based on bis-γ-hydroxypropylpolysiloxane (HPS) and bis-γ-aminopropylpolysiloxane (APS). Silicon-containing oligomeric azoinitiators using HPS were synthesized on the basis of cyclohexanone azo-bis-isobutyrohydrazone (AGN-CH) and bis-γ-hydroxypropylpolysiloxane bifunctional macrodiisocyanate (MDIHPS). MDIHPS was obtained by the interaction of GPS with 2,4 toluene diisocyanate (2,4-TDI). Oligomeric azoinitiators have been obtained, which have the structure RXR and (RX)nR, where R is a propylpolysiloxane block, X is a azo initiator block. For the synthesis of an oligomeric azo initiator based on bis-γ-aminopropyl polysiloxane (APS), a method was first developed for the synthesis of a monomeric azo initiator with terminal oxadiazolinylcarbamanate isocyanate groups (AGN-NCO) by the interaction of AGN-CH and 2,4-TDI at a molar ratio of 1: 2. On the basis of the obtained AGN-NCO and APS at a molar ratio of AGN-NCO: APS = 1: 1, an oligomeric azo initiator (OAI APS-P) was synthesized, which has the structure (RX)nR, where R is a propylpolysiloxane block, X is an azo initiator block. The structures of monomeric and oligomeric azo initiators have been studied by UV and IR spectroscopy, and the kinetic regularities of their synthesis have been calculated. On the basis of oligomeric azo initiators and styrene, block copolymers of the (AB)nA type were obtained by the method of thermal and photoinitiated radical polymerization, where A is a propylpolysiloxane block, B is an oligosyrene block with a constant value of the organosilicon block and a different size of the oligostyrene block. The structure of block copolymers was investigated by IR spectroscopy. It was shown that during photopolymerization, oligostyrene blocks of shorter length are formed than during thermopolymerization, and possible oxidation processes. The study of relaxation transitions by DSC in oligostyrene and propylpolysiloxane blocks of the BCP showed that the common heat capacity curves are the presence of two jumps in the heat capacity at the glass transition temperatures of the polysiloxane and oligostyrene microphase. A slight shift in the glass transition temperature of polysiloxane microphases in BCP towards higher temperatures compared to the homopolymer may be associated with the effect of oligostyrene microphase. With a decrease in the length of the oligosyrene block, a low-temperature shift in the glass transition temperature of oligostyrene blocks relative to the homopolymer and a depression of ∆Cp,2 are observed, which is associated with the suppression of mobility in oligodienic microphases by less mobile propylpolysiloxane blocks.

Publisher

National Academy of Sciences of Ukraine (Co. LTD Ukrinformnauka)

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