Computer simulation to predict size distribution of track-etched nanopores

Abstract

Abstract Track-etched nanoporous membranes prepared by swift heavy ion irradiation are promising for separation processes such as water purification. However, one drawback is that multiple pores are undesirably formed by pore overlapping to reduce separation performance. The techniques for predicting the size and amount of multiple pores in detail are still underdeveloped, which hinders the precise membrane design. In this study, a computer simulation program was developed to predict the size distribution of the track-etched pores. The program generates a number of single pores on the virtual grid plane to simulate random ion bombardment, finds multiple pores containing several single pores, and determines the multiple pore size by counting the inside grid points. All the multiple pores are categorized into different size classes, and the areal percentage occupied by the pores belonging to each size class is estimated. The simulation algorithm and the results of a model case simulation were described.