Analysis of trade-off relationships between resolution, line edge roughness, and sensitivity in extreme ultraviolet lithography using lasso regression-Reference-Cited by-同舟云学术

Analysis of trade-off relationships between resolution, line edge roughness, and sensitivity in extreme ultraviolet lithography using lasso regression

Published:2020-06-12 Issue:7 Volume:59 Page:076501
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Azumagawa Kazuki^ORCID,Kozawa Takahiro^ORCID

Funder

Ministry of Education, Culture, Sports, Science and Technology

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

https://iopscience.iop.org/article/10.35848/1347-4065/ab984e/pdf

Reference34 articles.

1. Front Matter: Volume 11147

2. High-NA EUV lithography exposure tool: program progress

3. High NA EUV lithography: Next step in EUV imaging

4. Chemical Amplification Resists for Microlithography

5. Resist blur and line edge roughness

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