Non-destructive initial-profile-free depth profile evaluation of thin-film sample using angle-resolved X-ray photoelectron spectroscopy and profile smoothing regularization
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
https://iopscience.iop.org/article/10.35848/1347-4065/ac1fba/pdf
Reference10 articles.
1. The determination of depth profiles from angle-dependent XPS using maximum entropy data analysis
2. Profiling nitrogen in ultrathin silicon oxynitrides with angle-resolved x-ray photoelectron spectroscopy
3. Thin films and interfaces in microelectronics: composition and chemistry as function of depth
4. XPS and angle resolved XPS, in the semiconductor industry: Characterization and metrology control of ultra-thin films
5. Non-destructive depth profile reconstruction of single-layer graphene using angle-resolved X-ray photoelectron spectroscopy
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Nondestructive initial-profile-free 3D elemental mapping in multilayer thin film structures based on EDX and a quadratic programming problem;Microscopy;2023-08-03
2. Non-destructive depth profile evaluation of multi-layer thin film stack using simultaneous analysis of data from multiple X-ray photoelectron spectroscopy instruments;Japanese Journal of Applied Physics;2022-03-16
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