Parallelizable Simulation of Material Effects of Chemical Shrink Process of Nanolithography
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Published:2006-10-06
Issue:10A
Volume:45
Page:7964-7974
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Li Tsung-Lung,Ting Jyh-Hua,Kung Chung-Yuan
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering