Author:
Lo Rong-Li,Lee W.-C.,Kwo J.
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
3 articles.
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1. Spin-coatable HfO2 resist for optical and electron beam lithographies;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2010-01
2. Scanning Probe Alloying Nanolithography;Scanning Probe Microscopy in Nanoscience and Nanotechnology;2009-12-04
3. Local oxidation nanolithography on Hf thin films using atomic force microscopy (AFM);Journal of Physics D: Applied Physics;2009-04-23