SrTa2O6Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition-Reference-Cited by-同舟云学术

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SrTa2O6Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition

Published:2001-12-15 Issue:Part 1, No. 12 Volume:40 Page:6941-6944
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Lee Won-Jae,You In-Kyu,Ryu Sang-Ouk,Yu Byoung-Gon,Cho Kyoung-Ik,Yoon Soon-Gil,Lee Chun-Su

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 47 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Theoretical prediction by DFT on properties of β′-SrTa2O6 crystal;Processing and Application of Ceramics;2023

2. Comprehensive theoretical investigation of electronic, structural, optical, elastic, and thermodynamic properties of orthorhombic SrTa₂O₆ compound;Canadian Journal of Physics;2022-12-01

3. Comprehensive theoretical investigation of electronic, structural, optical, elastic, and thermodynamic properties of orthorhombic SrTa2O6 compound;CAN J PHYS;2022

4. SrTa2O6 induced low voltage operation of InGaZnO thin-film transistors;Thin Solid Films;2018-11

5. Improvement of Amorphous InGaZnO Thin-Film Transistor Using High-k SrTa2 O6 as Gate Insulator Deposited by Sputtering Method;physica status solidi (a);2018-02-14

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