Properties of TiO2Thin Films on InP Substrate Prepared by Liquid Phase Deposition
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/41/i=7R/a=4689/pdf
Cited by 14 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. The growth of solution-gelation TiO2 and its application to InAlAs/InGaAs metamorphic high-electron-mobility transistor;Materials Science in Semiconductor Processing;2021-07
2. Influence of O2 flow rate on the characteristics of TiO2 thin films deposited by RF reactive sputtering;Materials Today: Proceedings;2021
3. Fabrication and photocatalytic performance evaluation of hydrodynamic erosion–resistant nano-TiO2–silicone resin composite films;Environmental Science and Pollution Research;2019-01-02
4. Fabrication of Visible-light Responsive N-doped TiO2 Nanothin Films via a Top–down Sol–gel Deposition Method Using NH4TiOF3 Single Crystals;Chemistry Letters;2018-05-05
5. Reduced Subthreshold Characteristics and Flicker Noise of an AlGaAs/InGaAs PHEMT Using Liquid Phase Deposited TiO2 as a Gate Dielectric;Materials;2016-10-25
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