Structural, Optical, and Field Emission Properties of Hydrogenated Amorphous Carbon Films Grown by Helical Resonator Plasma Enhanced Chemical Vapor Deposition-Reference-Cited by-同舟云学术

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Structural, Optical, and Field Emission Properties of Hydrogenated Amorphous Carbon Films Grown by Helical Resonator Plasma Enhanced Chemical Vapor Deposition

Published:1998-02-15 Issue:Part 1, No. 2 Volume:37 Page:440-444
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Shim Jae Yeob,Chi Eung Joon,Baik Hong Koo,Lee Sung Man

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

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