Process Latitude for Sub-200-Nanometer Synchrotron Orbital Radiation X-Ray Lithography
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Published:1993-12-30
Issue:Part 1, No. 12B
Volume:32
Page:5966-5970
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Oertel Heinrich K.,Chlebek Jürgen,Weiß Manfred
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering