Effective Carbon Contaminant Cleaning Condition Using Ozone Dissolved Water and Megasonic for Ru-Capped Extreme Ultraviolet Lithography Mask-Reference-Cited by-同舟云学术

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Effective Carbon Contaminant Cleaning Condition Using Ozone Dissolved Water and Megasonic for Ru-Capped Extreme Ultraviolet Lithography Mask

Published:2012-08-29 Issue: Volume:51 Page:096503
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Lee Seung-ho,Kang Bong-kyun,Kim Min-su,Ahn Jin-ho,Cho Han-ku,Lee Han-shin,Park Jin-Goo

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Sodium‐Doped Titania Self‐Rectifying Memristors for Crossbar Array Neuromorphic Architectures;Advanced Materials;2021-12-23

2. Contamination Removal From UV and EUV Photomasks;Developments in Surface Contamination and Cleaning, Volume 9;2017

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