Effect of Dynamic Bias Stress in Short-Channel ($L=1.5$ $\mu$m) p-Type Polycrystalline Silicon Thin-Film Transistors
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference29 articles.
1. Polysilicon TFT technology for active matrix OLED displays
2. Improved stability of short-channel hydrogenated N-channel polycrystalline silicon thin-film transistors with very thin ECR N2O-plasma gate oxide
3. Short Channel Effects in N- and P-Channel Polycrystalline Silicon Thin Film Transistors with Very Thin Electron Cyclotron Resonance N2O-Plasma Gate Dielectric
4. Reliability in Short-Channel p-Type Polycrystalline Silicon Thin-Film Transistor under High Gate and Drain Bias Stress
5. Positive Shift of Threshold Voltage in Short-Channel (L= 1.5 µm) p-Type Polycrystalline Silicon Thin-Film Transistor under Off-State Bias Stress
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