The Structure and Bonding State for Fullerene-Like Carbon Nitride Films with High Hardness Formed by Electron Cyclotron Resonance Plasma Sputtering
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Electrochemical performance at sputter-deposited nanocarbon film with different surface nitrogen-containing groups;Nanoscale;2019
2. Increased electrode activity during geosmin oxidation provided by Pt nanoparticle-embedded nanocarbon film;Nanoscale;2019
3. Low friction of graphene nanocrystallite embedded carbon nitride coatings prepared with MCECR plasma sputtering;Surface and Coatings Technology;2017-12
4. Structure and Electroanalytical Application of Nitrogen-doped Carbon Thin Film Electrode with Lower Nitrogen Concentration;Analytical Sciences;2015
5. Structure and electrochemical characterization of carbon films formed by unbalanced magnetron (UBM) sputtering method;Diamond and Related Materials;2014-10
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