Gas Flow Characteristics in a Plasma Process Chamber and Proposal of New Pulse-Controlled Gas Injection Method Using Interference Matrix Operation for Rapid Stabilization of Gas Pressure-Reference-Cited by-同舟云学术

Gas Flow Characteristics in a Plasma Process Chamber and Proposal of New Pulse-Controlled Gas Injection Method Using Interference Matrix Operation for Rapid Stabilization of Gas Pressure

Published:2011-12-15 Issue:1 Volume:51 Page:016001
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Morishita Sadaharu,Goto Tetsuya,Shirai Yasuyuki,Ohmi Tadahiro

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference10 articles.

1. Precise Control of Gas Concentration Ratio in Process Chamber

2. Precise and high-speed control of partial pressures of multiple gas species in plasma process chamber using pulse-controlled gas injection

3. Fast Gas Replacement in Plasma Process Chamber by Improving Gas Flow Pattern

4. Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition

5. High-Speed Damage-Free Contact Hole Etching Using Dual Shower Head Microwave-Excited High-Density-Plasma Equipment

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