Using Auger Electron Spectroscopy for Chemical Analysis of Plasma Damage Induced by Reactive Ion Etching of SiO2
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Published:1998-11-15
Issue:Part 1, No. 11
Volume:37
Page:6199-6203
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Matsui Miyako,Uchida Fumihiko,Katsuyama Kiyomi,Tokunaga Takafumi,Kojima Masayuki
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by
1 articles.
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