Ion-Bombardment-Induced Improvement of Photoresist Mask Properties for RF Sputter-Etching
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/16/i=8/a=1313/pdf
Cited by 19 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
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3. Methods/Principles of Deposition and Etching of Thin Films;Handbook of Semiconductor Interconnection Technology, Second Edition;2006-02-22
4. The interaction of ion implantation with photoresist ashing: A statistical experimental design study;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1991-05
5. Positive Radiation Resists;Semiconductor Lithography;1988
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