High-Accuracy Proximity Effect Correction for Mask Writing-Reference-Cited by-同舟云学术

High-Accuracy Proximity Effect Correction for Mask Writing

Published:2007-02-08 Issue:2 Volume:46 Page:826-833
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Abe Takayuki,Hattori Yoshiaki,Iijima Tomohiro,Anze Hirohito,Oogi Susumu,Kamikubo Takashi,Tsuchiya Seiichi,Shimizu Mitsuko,Matsuki Kazuto,Inoue Hideo,Tojo Toru,Takigawa Tadahiro

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference12 articles.

1. An exposure model for electron-sensitive resists

2. Corrections to proximity effects in electron beam lithography. I. Theory

3. Corrections to proximity effects in electron beam lithography. II. Implementation

4. Corrections to proximity effects in electron beam lithograhy. III. Experiments

5. Proximity correction on the AEBLE-150

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