Molecular Dynamics Calculation for Low-Energy Ion Implantation Process with Dynamic Annealing Effect
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Published:2005-04-21
Issue:4B
Volume:44
Page:2303-2306
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ISSN:0021-4922
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Container-title:Japanese Journal of Applied Physics
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language:en
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Short-container-title:Jpn. J. Appl. Phys.
Author:
Kwon Oh-Seob,Seo Ji-Hyun,Kim Ki-Dong,Won Tae-Young
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering