Development of Extreme Ultraviolet Interference Lithography System-Reference-Cited by-同舟云学术

Development of Extreme Ultraviolet Interference Lithography System

Published:2010-06-21 Issue:6 Volume:49 Page:06GD06
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Fukushima Yasuyuki,Sakagami Naoki,Kimura Teruhiko,Kamaji Yoshito,Iguchi Takafumi,Yamaguchi Yuya,Tada Masaki,Harada Tetsuo,Watanabe Takeo,Kinoshita Hiroo

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference17 articles.

1. Soft x-ray reduction lithography using multilayer mirrors

2. Exposure of 38 nm period grating patterns with extreme ultraviolet interferometric lithography

3. Sub-50 nm period patterns with EUV interference lithography

4. Patterning a 50-nm period grating using soft x-ray spatial frequency multiplication

5. Extreme ultraviolet interference lithography with incoherent light

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