Controlled Formation of Misfit Dislocations for Heteroepitaxial Growth of GaAs on (100) Si by Migration-Enhanced Epitaxy

Author:

Stolz Wolfgang,Horikoshi Yoshiji,Naganuma Mitsuru

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 25 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

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3. Growth of strained InGaSb quantum wells for p-FET on Si: Defects, interfaces, and electrical properties;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2014-09

4. Analysis of interfacial misfit dislocation by X-ray multiple diffraction;Solid State Communications;1993-11

5. Behavior of Misfit Dislocations in GaAs Epilayers Grown on Si at Low Temperature by Molecular Beam Epitaxy;Japanese Journal of Applied Physics;1993-01-30

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