New Organic Photo-Curable Nanoimprint Resist ≪mr-NIL210≫ for High Volume Fabrication Applying Soft PDMS-Based Stamps
Author:
Affiliation:
1. micro resist technology GmbH
2. University of Glasgow, School of Engineering
3. AMO GmbH
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Link
https://www.jstage.jst.go.jp/article/photopolymer/30/5/30_605/_pdf
Reference11 articles.
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3. 3. M. Malloy and L. C. Litt, J. Micro/Nanolith. MEMS MOEMS, 10 (2011) 032001.
4. 4. H. Lan and H. Liu, J. Nanosci. Nanotechnol., 13 (2013) 3145.
5. 5. L. Cui, J.-C. Han, G.-G. Wang, H.-Y. Zhang, R. Sun, and L.-H. Li, Nanoscale Res. Lett., 8 (2013) 472.
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