Metal Sensitizer in Chemically Amplified EUV Resist: a Study of Sensitivity Enhancement and Dissolution-Reference-Cited by-同舟云学术

Metal Sensitizer in Chemically Amplified EUV Resist: a Study of Sensitivity Enhancement and Dissolution

Published:2017 Issue:5 Volume:30 Page:591-597
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Jiang Jing¹,De Simone Danilo¹,Vandenberghe Geert¹

Affiliation:

1. Imec

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/30/5/30_591/_pdf

Reference23 articles.

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