Author:
Sakai Nobuji,Taniguchi Jun,Kawaguchi Kenshi,Ohtaguchi Makoto,Hirasawa Tamano
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference6 articles.
1. Imprint of sub‐25 nm vias and trenches in polymers
2. Nanoimprint lithography
3. [3]. J. Haisma, M. Verheijen, K. van den Heuvel and J. van den Berg: J. Vac. Sci. & Tech. B 14, 4124 (1996).
4. [4]. Crivello, J. V., Proc. SPE Reg. Tech. Conf. on "Photopolymers, Principles, Process and Materials", Nov. 8-10, Eiienville, N.Y., 267 (1982).
5. Measurement of Adhesive Force Between Mold and Photocurable Resin in Imprint Technology
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