Cohesion Property of Resist Pattern Surface Analyzed by Tip Indentation Method
Author:
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Link
http://www.jstage.jst.go.jp/article/photopolymer/17/3/17_3_441/_pdf
Reference10 articles.
1. Theory of size distribution of associating polymer aggregates. I. Spherical aggregates
2. Nano edge roughness in polymer resist patterns
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4. Atomic Force Microscope
5. Manipulation of Ag nanoparticles utilizing noncontact atomic force microscopy
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2. Micro Bubbles formed on ArF Excimer Resist Surface detected by Tip Scanning Method;Journal of Photopolymer Science and Technology;2007
3. Adhesion improvement of ArF resist pattern depending on BARC material;Microelectronic Engineering;2006-04
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