1. [1] W. Horspool, D. Armesto, Organic Photochemistry: A Comrehensive Treatment, Ellis Horwood, West Sussex (1992) p355.
2. [2] J. Kopcky, Organic Photochemistry: A Visual approach, VCH publishers, New York (1992) p164.
3. [3] J. V. Crivello and K. Dietliker, Photoinitiators for Free Radical, Cationic and Anionic Photopolymerization, 2nd Edition, G. Bradley Ed.,Wiley and Sons, New York (1988) p494.
4. Characterization of Fluoropolymer Resist for 157-nm Lithography
5. Novel Photoacid Generators for ArF Dry and Immersion Lithography: Application-Related Properties