High-sensitivity EUV Resists based on Tetrafluoroethylene contained Fluoropolymers-Reference-Cited by-同舟云学术

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High-sensitivity EUV Resists based on Tetrafluoroethylene contained Fluoropolymers

Published:2011 Issue:2 Volume:24 Page:165-172
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Yamashita Tsuneo,Morita Masamichi,Tanaka Yoshito,Santillan Jullius Joseph,Itani Toshiro

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/24/2/24_2_165/_pdf

Reference47 articles.

1. 1. K. Tawarayama, H. Aoyama, S. Magoshi, Y. Tanaka, S. Shirai, and H. Tanaka: Proc. SPIE 7271 (2009) 727118.

2. 2. O. Wood, C.-S. Koay, K. Petrillo, H. Mizuno, S. Raghunathan, J. Arnold, D. Horak, M. Burkhardt, G. McIntyre, Y. Deng, B. La Fontaine, U. Okoroanyanwu, A. Tchikoulaeva, T. Wallow, J. H.-C. Chen, M. Colburn,S. S.-C. Fan, B. Haran, and Y. Yin: Proc. SPIE 7271 (2009) 727104

3. 3. G. Vandentop, M. Chandhok, E. S. Putna, T. R. Younkin, J. S. Clarke, S.Carson, A. Myers, M. Leeson, G. Zhang, T. Liang, and T. Murachi: Proc.SPIE 7271 (2009) 727116.

4. 4. J.-O. Park, C. Koh, D. Goo, I. Kim, C. Park, J. Lee, J. Park, J. Yeo, S.-W.Choi, and C.-H. Park: Proc. SPIE 7271 (2009) 727114.

5. 5. H. Meiling, N. Buzing, K. Cummings, N. Harned, B. Hultermans, R. de Jonge, B. Kessels, P. Ku¨ rz, S. Lok, M. Lowisch, J. Mallman, B. Pierson, C. Wagner, A. van Dijk, E. van Setten, and J. Zimmerman: Proc. SPIE 7271 (2009) 727102.

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1. Effects of effective reaction radius for neutralization on performance of chemically amplified resists;Japanese Journal of Applied Physics;2014-05-27

2. Theoretical study on stochastic defect generation in chemically amplified resist process for extreme ultraviolet lithography;Japanese Journal of Applied Physics;2014-05-16

3. Stochastic effects in 11 nm imaging of extreme ultraviolet lithography with chemically amplified resists;Japanese Journal of Applied Physics;2014-02-03

4. Novel Fluorinated Compounds that Improve Durability of Antistick Layer for Quartz Mold;Journal of Photopolymer Science and Technology;2014

5. Relationship between Defects and Stochastic Effect in Chemically Amplified Resists Used for Extreme Ultraviolet Lithography;Japanese Journal of Applied Physics;2013-07-01

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