Removal of Polymers for KrF and ArF Photoresist Using Hydrogen Radicals Containing a Small Amount of Oxidizing Radicals-Reference-Cited by-同舟云学术

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Removal of Polymers for KrF and ArF Photoresist Using Hydrogen Radicals Containing a Small Amount of Oxidizing Radicals

Published:2018-06-25 Issue:3 Volume:31 Page:419-424
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Yamamoto Masashi¹,Taki Tomohiro¹,Sunada Takuto¹,Shikama Tomokazu¹,Nagaoka Shiro²,Umemoto Hironobu³,Horibe Hideo⁴

Affiliation:

1. Department of Electrical and Computer Engineering, National Institute of Technology, Kagawa College

2. Department of Electronic Systems Engineering, National Institute of Technology, Kagawa College

3. Graduate School of Integrated Science and Technology, Shizuoka University

4. Graduate School of Engineering, Osaka City University

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/31/3/31_419/_pdf

Reference30 articles.

1. 1. H. Morinaga, T. Futatsuki, T. Ohmi, E. Fuchita, M. Oda, and C. Hayashi, J. Electrochem. Soc., 142 (1995) 966.

2. 2. K. Hirose, H. Shimada, S. Shimomura, M. Onodera, and T. Ohmi, J. Electrochem. Soc., 141 (1994) 192.

3. 3. M. A. Worsley, S. F. Bent, N. C. M. Fuller, and T. Dalton, J. Appl. Phys., 100 (2006) 083301.

4. 4. K. Shinagawa, H. Shindo, K. Kusaba, T. Koromogawa, J. Yamamoto, and M. Furukawa, Jpn. J. Appl. Phys., 40 (2001) 5856.

5. 5. S. Fujimura and H. Yano, J. Electrochem. Soc., 135 (1988) 1195.

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