Going Beyond the Ohnishi Parameter: Correlating Dissociation Energies to Polymer Etch Rates-Reference-Cited by-同舟云学术

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Going Beyond the Ohnishi Parameter: Correlating Dissociation Energies to Polymer Etch Rates

Published:2024-06-25 Issue:3 Volume:37 Page:267-272
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Lee Stanfield Youngwon¹,Jang Min Kyung¹,Ahn Jae Yun¹,Lee Jung June¹,Park Jin Hong¹

Affiliation:

1. DuPont Electronics & Industrial

Publisher

Technical Association of Photopolymers, Japan

Link

https://www.jstage.jst.go.jp/article/photopolymer/37/3/37_267/_pdf

Reference24 articles.

1. 1. H. Xu, J. Blackwell, T. Younkin, and K. Min, Proc. SPIE, 7273 (2009) 72731J.

2. 2. P. Vanelderen, N. Valdenbroeck, Y. Liang, V. Van Driessche, D. Guerrero, A. Chackco, D. De Simone, and G. Vandenberghe. Proc. SPIE, 11326 (2020) 1132615.

3. 3. P. Vanelderen, D. De Simone, V. Spampinato, A. Franquet and G. Vandenberghe. J. Photopolym. Sci. Technol., 31 (2018) 209.

4. 4. M. Bhave, J. Meador, J. Claypool, S. Deshpande, J. Akers, and A. Lindgren. Proc. SPIE, 4690 (2002) 0277.

5. 5. S. Li, J. Lowes, R. Zhang, M. Luo, K. Brakensiek, V. Van Driessche, and D. Guerrero. Proc. SPIE, 12498 (2023) 12498.

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