Author:
Bowden Murrae,Malik Sanjay,Dilocker Stephanie
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference34 articles.
1. 1. J.R. Franco, J.R. Havas and H.A. Levine, U.S. Patent 3,873,361 1973; J.R. Havas, Electrochem. Soc. Ext. Abstr., 2 (1976) 743.
2. 2. B. Lin in “Introduction to Microlithography”, L.F. Thompson, C.G. Willson and M.J. Bowden, Eds., ACS Symposium Series, (1983) 219.
3. Gas‐Phase‐Functionalized Plasma‐Developed Resists:Initial Concepts and Results for Electron‐Beam Exposure
4. Silicon-Containing Resists For Bi-Layer Resist Systems
Cited by
7 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献