Negative-tone Imaging with EUV Exposure
Author:
Affiliation:
1. Research & Development management headquarters, Electronic Materials Research Laboratories, FUJIFILM Corporation
2. EUVL Infrastructure Development Center, Inc. (EIDEC)
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Link
https://www.jstage.jst.go.jp/article/photopolymer/28/4/28_489/_pdf
Reference27 articles.
1. 1. ITRS, The international Technology Roadmap for Semiconductors (2013).
2. 2. P. P. Naulleau, C. N. Anderson, L-M. Baclea-an, P. Denham, S. George, K. A. Goldberg, G. Jones, B. McClinton, R. Miyakawa, S. Rekawa, and N. Smith, Proc. SPIE, 7972 (2011) 797202.
3. 3. T. Wallow, D. Civay, S. Wang, H.F. Hoefnagels, C. Verspaget, G. Tanriseven, A. Fumar-Pici, S. Hansen, J. Schefske, M. Singh, R. Maas, Y. van Dommelen, and J. Mallmann, Proc. SPIE, 8322 (2012) 83221J.
4. 4. T. Wallow, C. Higgins, R. Brainard, K. Petrillo, W. Montgomery, K. C.-s. Koay, G. Denbeaux, O. Wood, Y. Wei, Proc. SPIE, 6921 (2008) 69211F.
5. 5. H. Tsubaki, S. Tarutani, H. Takizawa, and T. Goto, 2012 International Symposium on Extreme Ultraviolet Lithography (2012).
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