Resist Materials for UV Nanoimprint Lithography: Approaches to Rapid Resist Spreading on Dispensing Based UV-NIL
Author:
Affiliation:
1. FUJIFILM Corporation
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Link
https://www.jstage.jst.go.jp/article/photopolymer/29/1/29_45/_pdf
Reference13 articles.
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3. 3. I. Yoneda, S. Mikami, T. Ota, T. Koshiba, M. Ito, T. Nakasugi, T. Higashiki, Proc. SPIE, 6921 (2008) 692104.
4. 4. Z. Ye, R. Ramos, C. Brooks, P. Hellebrekers, S. Carden and D. LaBrake, Proc. SPIE, 7637 (2010) 76371A.
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1. Droplet-Dispensed Ultraviolet Nanoimprint Lithography in Mixed Condensable Gas of Trans-1,3,3,3-Tetrafluoropropene and Trans-1-Chloro-3,3,3-Trifluoropropene;Journal of Photopolymer Science and Technology;2022-12-16
2. Progress of Nanoimprint Technology;Journal of The Japan Institute of Electronics Packaging;2019-03-01
3. Double nanoimprint lithography: A technology for effectively reducing feature size;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-11
4. Measurement of viscoelasticity of UV photoresist used for nanoimprint lithography under confinement in nanometer-sized gaps;Japanese Journal of Applied Physics;2017-05-11
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