EUVL Research Activity at Center for EUV Lithography-Reference-Cited by-同舟云学术

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EUVL Research Activity at Center for EUV Lithography

Published:2016 Issue:5 Volume:29 Page:737-744
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Watanabe Takeo¹,Harada Tetsuo¹

Affiliation:

1. Center for EUV Lithography,Laboratory of Advanced Science and Technology for Industry, University of Hyogo

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/29/5/29_737/_pdf

Reference23 articles.

1. 1. H. Kinoshita, K. Kurihara, Y. Ishii, and Y. Torii, J. Vac. Sci. Technol., B7 (1989) 1648.

2. 2. The summaries of the International Symposium of Extreme Ultraviolet Lithography 2016.

3. 3. ITRS Roadmap [http//www.itrs.net/].

4. 4. S. Hashimoto, A. Ando, S. Amano, Y. Haruyama, T. Hattori, K. Kanda, H. Kinoshita, S. Matsui, H. Mekaru, S. Miyamoto, T. Mochizuki, M. Niibe, Y. Shoji, Y. Utsumi, T. Watanabe, and H. Tsubakino, Trans. Mater. Res. Soc. Jpn., 26 (2001) 783.

5. 5. H. H. Solak, C. David, J. Gobrecht, V. Golovkina, F. Cerrina, S. O. Kim, and P. F. Nealey, Microelectron. Eng., 67 (2003) 56.

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1. Aryl Sulfonates as Initiators for Extreme Ultraviolet Lithography: Applications in Epoxy-Based Hybrid Materials;ChemPhotoChem;2018-03-06

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