Author:
Ranade Pushkar,Takeuchi Hideki,King Tsu-Jae,Hu Chenming
Publisher
The Electrochemical Society
Subject
Electrical and Electronic Engineering,Electrochemistry,Physical and Theoretical Chemistry,General Materials Science,General Chemical Engineering
Reference11 articles.
1. International Technology Roadmap for Semiconductors
, Semiconductor Industry Association, 1999.
2. Impact of gate workfunction on device performance at the 50 nm technology node
3. Dual-metal gate CMOS technology with ultrathin silicon nitride gate dielectric
4. Q. Lu, R. Lin, P. Ranade, T.-J. King, and C. Hu, in
VLSI Technology Digest
, p. 45, IEEE, New York (2001).
Cited by
89 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献