The Crack Opening Method in Silicon Wafer Bonding: How Useful Is It?

Author:

Martini T.1,Steinkirchner J.1,Gösele U.1

Affiliation:

1. Max‐Planck‐Institute of Microstructure Physics, D‐06120 Halle/Saale, Germany

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Cited by 49 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

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2. Void Formation Mechanism Related to Particles During Wafer-to-Wafer Direct Bonding;ECS Journal of Solid State Science and Technology;2022-06-01

3. Thick-film silicon-on-insulator wafers preparation and properties;Handbook of Silicon Based MEMS Materials and Technologies;2020

4. Low-temperature direct bonding of silicon nitride to glass;RSC Advances;2018

5. PMMA Solution Assisted Room Temperature Bonding for PMMA–PC Hybrid Devices;Micromachines;2017-09-20

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