Author:
Huang C. C.,Cheng C. H.,Chin Albert,Chou C. P.
Publisher
The Electrochemical Society
Subject
Electrical and Electronic Engineering,Electrochemistry,Physical and Theoretical Chemistry,General Materials Science,General Chemical Engineering
Reference25 articles.
1. C.-M. Hung, Y.-C. Ho, I.-C. Wu, and K. O , IEEE MTT-S Int. Microwave Symp. Dig., 505 (1998).
2. Analog characteristics of metal-insulator-metal capacitors using PECVD nitride dielectrics
3. Characterization and comparison of PECVD silicon nitride and silicon oxynitride dielectric for MIM capacitors
4. L. Y. Tu, H. L. Lin, L. L. Chao, D. Wu, C. S. Tsai, C. Wang, C. F. Huang, C. H. Lin, and J. Sun , in
Symposium VLSI Tech. Dig.
, p. 79 (2003).
5. A study of MIMIM on-chip capacitor using Cu/SiO2 interconnect technology
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