Selection and Optimization of Corrosion Inhibitors for Improved Cu CMP and Post-Cu CMP Cleaning-Reference-Cited by-同舟云学术

Selection and Optimization of Corrosion Inhibitors for Improved Cu CMP and Post-Cu CMP Cleaning

Published:2019 Issue:5 Volume:8 Page:P3058-P3062
ISSN:2162-8769
Container-title:ECS Journal of Solid State Science and Technology
language:en
Short-container-title:ECS J. Solid State Sci. Technol.

Author:

Ryu Heon-Yul^ORCID,Cho Byoung-Jun,Yerriboina Nagendra Prasad^ORCID,Lee Chan-Hee,Hwang Jun-Kil,Hamada Satomi,Wada Yutaka,Hiyama Hirokuni,Park Jin-Goo^ORCID

Publisher

The Electrochemical Society

Subject

Electronic, Optical and Magnetic Materials

Reference36 articles.

1. Corrosion inhibition by benzotriazole derivatives and sodium dodecyl sulphate as corrosion inhibitors for copper in ground water at different temperatures

2. Preparation of superhydrophobic films on copper substrate for corrosion protection

3. Effect of temperature in titanium chemical mechanical planarization

4. Chemical Mechanical Planarization: Slurry Chemistry, Materials, and Mechanisms

5. Effect of nitrogen doping on the performance of Ge2Sb2Te5films in chemical mechanical polishing

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