New Positive EB Resist with Strong Resistance to Plasma Damage-Reference-Cited by-同舟云学术

New Positive EB Resist with Strong Resistance to Plasma Damage

Published:1992-03-01 Issue:3 Volume:139 Page:L33-L34
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Yamaguchi Kazuo¹²³⁴,Ozaki Hiroyuki¹²³⁴,Hirao Akira¹²³⁴,Hirose Nobumitsu¹²³⁴,Harada Yuuichi¹²³⁴,Uzawa Yoshinori¹²³⁴,Sekine Matsuo¹²³⁴,Yoshimori Shigeru¹²³⁴,Kawamura Mitsuo¹²³⁴

Affiliation:

1. Kanagawa University, Kanagawa 259‐12, Japan

2. Tokyo Institute of Technology, Tokyo 152, Japan

3. Tokyo Institute of Technology, Kanagawa 227, Japan

4. Takushoku University, Tokyo 193, Japan

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2069330/pdf

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