Thermal Nitridation of SiO2 Films in Ammonia: The Role of Hydrogen-Reference-Cited by-同舟云学术

Thermal Nitridation of SiO2 Films in Ammonia: The Role of Hydrogen

Published:1996-04-01 Issue:4 Volume:143 Page:1426-1434
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Baumvol I. J. R.¹,Stedile F. C.²,Ganem J.‐J.¹²³,Trimaille I.¹²³,Rigo S.¹²³

Affiliation:

1. Instituto de Física, Porto Alegre, RS, 91540‐000, Brazil

2. Instituto de Química‐UFRGS, Porto Alegre, RS, 91540‐000, Brazil

3. Groupe de Physique des Solides, URA17‐CNRS, Universités Paris 7 et 6, Paris 75251, France

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1836655/pdf

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