Abstract
In this work, we investigated the ferroelectric properties of Hf0.5Zr0.5O2 (HZO) Metal-Ferroelectric-Metal (MFM) capacitors on various refractory electrodes, including TiN, TaN, W, and Mo. By comparing different electrodes and annealing temperature, we found that the MFM capacitors with TiN and W electrodes showed both higher remanent polarization (2Pr) and lower leakage current for post-metal annealing (PMA) temperatures ranging from 400 °C to 600 °C. Moreover, the MFM capacitor with W electrode showed better saturated polarization-voltage (P-V) curve and less “wake up effect” during the polarization switching cycles, while the MFM capacitor with TiN electrode showed the lowest leakage current. The correlation of crystallization quality studied by X-ray diffraction and the ferroelectric characteristics for each type of MFM capacitors were also presented and compared in this study.
Funder
Taiwan Semiconductor Manufacturing Company
Ministry of Science and Technology, Taiwan
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Cited by
6 articles.
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