Abstract
We report the effect of extended duration electron beam exposure on the minority carrier transport properties of 10 MeV proton irradiated (fluence ∼1014 cm−2) Si-doped β-Ga2O3 Schottky rectifiers. The diffusion length (L) of minority carriers is found to decrease with temperature from 330 nm at 21 °C to 289 nm at 120 °C, with an activation energy of ∼26 meV. This energy corresponds to the presence of shallow Si trap-levels. Extended duration electron beam exposure enhances L from 330 nm to 726 nm at room temperature. The rate of increase for L is lower with increased temperature, with an activation energy of 43 meV. Finally, a brief comparison of the effect of electron injection on proton irradiated, alpha-particle irradiated and a reference Si-doped β-Ga2O3 Schottky rectifiers is presented.
Funder
North Atlantic Treaty Organization
National Science Foundation, Division of Materials Research
Department of Defense, Defense Threat Reduction Agency
National Science Foundation, Division of Electrical, Communications and Cyber Systems
United States-Israel Binational Science Foundation
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Cited by
13 articles.
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