Boron Nitride and Silicon Boron Nitride Film and Polish Characterization-Reference-Cited by-同舟云学术

Boron Nitride and Silicon Boron Nitride Film and Polish Characterization

Published:1993-12-01 Issue:12 Volume:140 Page:3607-3611
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Neureither B.¹²³,Basa C.¹²³,Sandwick T.¹²³,Blumenstock K.¹²³

Affiliation:

1. Siemens AG, 81730 Munich, Germany

2. International Business Machines, Technology Products, Hopewell Junction, New York 12533

3. Siemens AG, Semiconductor Division, 93049 Regensburg, Germany

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2221134/pdf

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