Chemically Assisted Ion Beam Etching for Silicon‐Based Microfabrication-Reference-Cited by-同舟云学术

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Chemically Assisted Ion Beam Etching for Silicon‐Based Microfabrication

Published:1994-06-01 Issue:6 Volume:141 Page:1585-1589
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Chieh Y. S.¹,Krusius J. P.¹,Chapman P.¹

Affiliation:

1. School of Electrical Engineering, and National Nanofabrication Facility, Cornell University, Ithaca, New York 14853‐5401

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2054966/pdf

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Angled etching of Si by ClF3–Ar gas cluster injection;Japanese Journal of Applied Physics;2017-05-02

2. Oblique-Directional Plasma Etching of Si Using a Faraday Cage;Journal of The Electrochemical Society;2009

3. Fabrication of out-of-plane micromirrors in silicon-on-insulator planar waveguides;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2006-05

4. Beyond micromachining: the potential of diatoms;Trends in Biotechnology;1999-05

5. Carbon nanotube tipped atomic force microscopy for measurement of <100 nm etch morphology on semiconductors;Applied Physics Letters;1998-07-27

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