Determination of the Model for the Chemical Structure of Porous PECVD Low-k Films-Reference-Cited by-同舟云学术

Determination of the Model for the Chemical Structure of Porous PECVD Low-k Films

Published:2014-11-21 Issue:1 Volume:4 Page:N3140-N3145
ISSN:2162-8769
Container-title:ECS Journal of Solid State Science and Technology
language:en
Short-container-title:ECS J. Solid State Sci. Technol.

Author:

Verdonck P.,Le Quoc Toan,Devonport J.,Huanca D. R.,dos Santos Filho S. G.,Conard T.,Meersschaut J.,Baklanov M. R.,Van Elshocht S.

Publisher

The Electrochemical Society

Subject

Electronic, Optical and Magnetic Materials

Reference15 articles.

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3. Improving mechanical robustness of ultralow-k SiOCH plasma enhanced chemical vapor deposition glasses by controlled porogen decomposition prior to UV-hardening

4. Impact of wavelength of UV light and UV cure time on chemical and mechanical properties of PECVD deposited porous ultra low-k films

5. A theoretical and experimental study of atomic-layer-deposited films onto porous dielectric substrates

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