Metallic Impurity Gettering and Secondary Defect Formation in Megaelectron Volt Self‐Implanted Czochralski and Float‐Zone Silicon-Reference-Cited by-同舟云学术

Metallic Impurity Gettering and Secondary Defect Formation in Megaelectron Volt Self‐Implanted Czochralski and Float‐Zone Silicon

Published:1997-08-01 Issue:8 Volume:144 Page:2872-2881
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Brown R. A.¹²,Kononchuk O.¹²,Bondarenko I.¹²,Romanowski A.¹²,Radzimski Z.¹²,Rozgonyi G. A.¹²,Gonzalez F.¹²

Affiliation:

1. Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695‐7916

2. Micron Technology, Incorporated, Boise, Idaho 83707

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1837910/pdf

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