Interfacial Diffusion of Metal Atoms during Air Annealing of Chemically Deposited ZnS ‐ CuS and PbS ‐ CuS Thin Films-Reference-Cited by-同舟云学术

Interfacial Diffusion of Metal Atoms during Air Annealing of Chemically Deposited ZnS ‐ CuS and PbS ‐ CuS Thin Films

Published:1994-09-01 Issue:9 Volume:141 Page:2536-2541
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Huang L.¹,Nair P. K.²,Nair M. T. S.²,Zingaro R. A.¹,Meyers E. A.¹

Affiliation:

1. Department of Chemistry, Texas A & M University, College Station, Texas 77843

2. Laboratorio de Energia Solar, IIM, Universidad Nacional Autonoma de Mexico, 62580 Temixco, Morelos, Mexico

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.2055157/pdf

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