Improving MTBC for Al Etch Using an In Situ Chamber Clean
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Published:2013-03-08
Issue:1
Volume:52
Page:301-305
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ISSN:1938-5862
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Container-title:ECS Transactions
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language:
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Short-container-title:ECS Trans.
Author:
Chen Feng,Huang Y.,Ge Q.,Ng H.
Abstract
An in-situ chamber clean process was optimized to extend the aluminum etch chamber manufacturing time between cleans (MTBC) without damaging the chamber interior while also maintaining reasonable throughput. Chlorine/oxygen removes carbon-based polymer most efficiently, while boron trichloride/chlorine is best for removing aluminum byproducts. The greatest improvement in lid/sidewall cleaning uniformity was achieved by raising pressure. After implementing the optimized cleaning process, MTBC improved fourfold.
Publisher
The Electrochemical Society