A Sono-Electrochemical Technique for Enhanced Particle Removal from Tantalum Surfaces-Reference-Cited by-同舟云学术

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A Sono-Electrochemical Technique for Enhanced Particle Removal from Tantalum Surfaces

Published:2014-02-26 Issue:5 Volume:3 Page:P49-P52
ISSN:2162-8742
Container-title:ECS Solid State Letters
language:en
Short-container-title:ECS Solid State Letters

Author:

Balachandran R.,Deymier P.,Raghavan S.,Keswani M.

Publisher

The Electrochemical Society

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Coupling Supramolecular Assemblies and Reactive Oxygen Species (ROS) with Megasonic Action for Applications in Shallow Trench Isolation (STI) Post-Chemical Mechanical Planarization (p-CMP) Cleaning;ACS Omega;2022-07-21

2. Fabrication of micro pits based on megasonic assisted through-mask electrochemical micromachining;Ultrasonics;2020-01

3. Investigation of a Standard Particle Deposition System on Wafer Surface and Its Application to Wafer Cleaning;ECS Journal of Solid State Science and Technology;2019

4. Sono-electrochemical recovery of metal ions from their aqueous solutions;Journal of Hazardous Materials;2016-11

5. Review—Understanding and Controlling Electrochemical Effects in Wet Processing;ECS Journal of Solid State Science and Technology;2016

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